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	• Nano Technology • 3D Measurement • Aberration Measurement • FAQs			NEO-Series Nano Fabrication System   Catalog Download  (968KB)   The system is capable of writing nano-scale structures at high speed directly on to the surface of a resist coated substrate (examples of typical substrates include semiconductor wafers or glass). The substrates are rotated in normal air condition. Compared to conventional lithography systems the NEO-500 has advantages of compact size and low investment costs without comprising performance. These advantages are achieved by using a visible semiconductor laser as a light source and Pulstec's uniquely designed optics. • Optical filter • Reflection prevention structure • Photonic crystal • Nano inprint mold • The system was co-developed with the Center for Applied Near field Optics Research in the National Institute of Advanced Industrial Science and Technology (AIST).     •Please refer to "Optical Application FAQs" if you have any questions for Optical Application. PDF files are in Adobe's Portable Document Format. To view them you need Adobe(R) Reader(R) by Adobe Systems Incorporated. To Optical Application Home     |     Product     |     R&D     |     Support     |     IR Information     |     About Pulstec