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Past Exhibition Information
The exhibition is over. Thank you for dropping in our booth.
Please feel free to contact us if you have any inquiry about our products.
MEDIA-TECH Global Expo & Summit
Date and time
May 19, 2010 - May 21, 2010
Location
Messe Frankfurt, Germany
Lineup
MASTER, Disc Evaluation Systems
ConceptPulstec achieved shorter evaluation time with the same quality of the current MASTER system. It is now capable of 2x evaluation!
In addition, Pulstec original board is carried and not only the evaluation by 2x but the measurement of R,RE Multi Layer is supported.
Web sitehttp://www.media-tech.net/
Contact Us
nano tech 2010
Date and TimeFeb. 17(Wed) - Feb. 19(Fri), 2010 10:00 am - 5:00 pm
Location
East Exhibition Hall 4,5,6 & Conference Tower, Tokyo Big Sight, Japan
Booth number D-07
Lineup Nano Fabrication System NEO-Series
ConceptNEO series can draw the nano-scale structure onto the resist on the object in wide area at high-speed by its rotating unit. By using the semiconductor laser,the system can be used in the atmosphere, compact and low cost compared with the conventional lithography system. Not only the flat surface, it can draw on the 3D shape object, such as curved or rolling surface, because of its auto-focusing function
We look forward to meeting you at the show. Please feel free to contact us if you have any inquiry about our system.
Websitehttp://www.nanotechexpo.jp/en/index.html
 
SEMICON Japan 2009
Date and TimeDec. 2 (Wed) - Dec. 4 (Fri), 2009 10:00 am - 5:00 pm
Location
Makuhari Messe, Chiba, Japan
International Exhibition Hall, International Conference Hall
Booth No. P-20
ConceptPulstec will exhibit NEO-Series at our booth. The system can draw the um or sub-um-scale dot and line pattern by using the semiconductor laser and the rotating unit at high speed. In this exhibition, we will exhibit 3 dimension shape exposing system.
We look forward to meeting you at the show. Please feel free to contact us if you have any inquiry about our system.
LineupNEO-Series Nano Fabrication System
Websitehttp://www.semiconjapan.org/sj-en/index.htm

MEDIA-TECH Europe 2009
Date and time
April 22 (Wed) - 23 (Thurs), 2009
April 24 (Fri), 2009

10:00 am - 6:00 pm
9:00 am - 2:00 pm

Location
Forum Messe Frankfurt, Germany
ConceptSTAMPER Checker for BD-ROM is now exhibited. :
The analysis tools of STAMPER for BD-ROM is released. This system itself is upgraded based on MASTER system. The cover layer issue is also completed, and it realized repeatability and good correlation.
On the other hand, BCA Writer and Checker System that needed for BD production in the near future is also carried out. And also carry out Next Generation Media Evaluation System (Hologram, Near field and etc.)
Please come and take a look at our new system.
* Replica Disc evaluation is also possible at the show, please come with some discs.
We look forward to meeting you at the show. Please feel free to contact us if you have any inquiry about our system.
LineupMASTER STAMPER
Stamper Checker for BD-ROM, R,RE and Replica disc with 1 system.
Features
This system itself is upgraded based on MASTER system keeping usability.
Adopting Spin Coater method for Cover Layer issue.
Great repeatability is realized.

Application
Productive efficiency will be increasing if possible to check the quality of STAMPER before replication stage.
Websitehttp://www.media-tech.net/europe09.html
 
Lens Expo 2009
Date and time
April 22 (Wed) - 24 (Fri), 2009 10:00am to 5:00pm
Location
Pacifico Yokohama (Yokohama,Kanagawa Japan)
ConceptWe will be exhibiting a new-type Wavefront Sensor and its applications. Please take a look at our new model. Free trials are offered at this time, so please come and visit us!
We look forward to meeting you at Lens Expo. If you have any inquiry about our product or exhibit, please feel free to contact us.
LineupNew-type Wavefront Sensor: PWS-1000
Pulstec is the only manufacturer in Japan who possess technology of Shack-Hartmann method high-speed wavefront sensor. The conventional type was developed for R&D purpose, meanwhile the new sensor is aimed at mass-production use.
Features
1Improvement of data update speed
2Wide range of customization available
3Improvement of user-friendliness
4Pursued easy measurement
5Increased functions and expanded possibilities
6Simplified handling of measurement data

Application
1Measures wavefront of lens and other optical components.
2Compared to conventional measuring method, it is effective in adjustment process because of low cost, high resistance to vibration, and its high-speed measurement.
Lens Unit Check and Adjustment System: LUCAS
This system is to check and adjust lens unit by using Shack-Hartmann method wavefront sensor.With its high speed and stability, it is suitable for production line where tact is required. You can select necessary functions from accessory catalog freely, so it is easy to change the system set-up. This will offer you extensibility of the system and we are sure you will be able to use the system at a long term.
Webistehttp://www.optronics.co.jp/en/lens/

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