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News Record

  
 Exhibition at InterOpto'08

 InterOpto'08
The exhibition is over. Thank you for dropping in.
Please feel free to contact us if you have any inquiry about our products.


Date and time
September 10 - 12, 2008 10:00am to 5:00pm
Location
Makuhari Messe, International Exhibition Hall 9
Booth No. 19-2
ConceptPulstec will exhibit NEO-series at our booth. The system can draw the nano-scale pattern by the semiconductor laser at high speed. The application of NEO-series can be manufacturing grating structure, optical filter, anti-reflective structure, nano-imprint molding, and optical disc mastering.
Lineup
NEO-Series Nano Fabrication System
Web sitehttp://www.oitda.or.jp/main/io/io08home.html

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